TiW_Stress_Control_2.pdf — Micro/Nano Technology Center

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Micro/Nano Technology Center

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- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
- Excess Equipment
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- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
User InformationUser Information Dropdown Toggle
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
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ECE 544 Microfabrication/MEMS Laboratory

PDF document icon TiW_Stress_Control_2.pdf — PDF document, 312 KB (319880 bytes)

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