Wafer Thermal Processing

Oxidation, Diffusion & Annealing

Multiple tube furnaces for thermal processes include wet/dry oxidation, high-temperature annealing, and boron/phosphorous diffusion.

Rapid Thermal Processes

RTP system for silicon based gate oxide growth and rapid thermal annealing of implanted layers.

Vacuum Cure Oven

Multiple programmable vacuum ovens capable of heating to 400°C.