![](https://louisville.edu/micronano/equipment-capabilities/equipment/furnace1.jpg)
Oxidation, Diffusion & Annealing
Multiple tube furnaces for thermal processes include wet/dry oxidation, high-temperature annealing, and boron/phosphorous diffusion.
![](https://louisville.edu/micronano/equipment-capabilities/equipment/rtp.jpg)
Rapid Thermal Processes
RTP system for silicon based gate oxide growth and rapid thermal annealing of implanted layers.
![](https://louisville.edu/micronano/equipment-capabilities/equipment/ir.jpg)
Vacuum Cure Oven
Multiple programmable vacuum ovens capable of heating to 400°C.