Rinse Solvent T1100 — Micro/Nano Technology Center

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Micro/Nano Technology Center

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- Photolithography
- Wafer Thermal Processing
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- Capabilities & Equipment
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
- Excess Equipment
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- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
User InformationUser Information Dropdown Toggle
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
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- MNTC Rates July 1, 2025
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- MNTC Rates July 1, 2025
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ECE 544 Microfabrication/MEMS Laboratory
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Rinse Solvent T1100

PDF document icon Rinse Solvent T1100.pdf — PDF document, 194 KB (199023 bytes)

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