AZ P4903 Photoresist — Micro/Nano Technology Center

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Micro/Nano Technology Center

Home
About Us
- Administration and Staff
- Annual Reports
About UsAbout Us Dropdown Toggle
- Administration and Staff
- Annual Reports
Capabilities & Equipment
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
Capabilities & EquipmentCapabilities & Equipment Dropdown Toggle
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
How to Become a User
User Information
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
User InformationUser Information Dropdown Toggle
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
What Does It Cost?
- MNTC Rates Effective 6-1-2023
What Does It Cost?What Does It Cost? Dropdown Toggle
- MNTC Rates Effective 6-1-2023
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- Inquiry form
Contact UsContact Us Dropdown Toggle
- Inquiry form
Self - Guided Tour
ECE 544 Microfabrication/MEMS Laboratory
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FilesFiles Dropdown Toggle
- Documents

AZ P4903 Photoresist

PDF document icon AZ P4903 PhotoResist.pdf — PDF document, 353 KB (361636 bytes)

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