AZ P4903 Photoresist — Micro/Nano Technology Center

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Micro/Nano Technology Center

Home
About Us
- Administration and Staff
- Annual Reports
About UsAbout Us Dropdown Toggle
- Administration and Staff
- Annual Reports
Capabilities & Equipment
- Capabilities & Equipment
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
- Excess Equipment
Capabilities & EquipmentCapabilities & Equipment Dropdown Toggle
- Capabilities & Equipment
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
- Excess Equipment
How to Become a User
User Information
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
User InformationUser Information Dropdown Toggle
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
- TiW_Stress_Control_2.pdf
- GeSndeptestdata.xlsx
MNTC Rates
- MNTC Rates July 1, 2025
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- MNTC Rates July 1, 2025
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ECE 544 Microfabrication/MEMS Laboratory
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AZ P4903 Photoresist

PDF document icon AZ P4903 PhotoResist.pdf — PDF document, 353 KB (361636 bytes)

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