az4620photoresist.pdf — Micro/Nano Technology Center

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Micro/Nano Technology Center

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Capabilities & Equipment
- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
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- Photolithography
- Wafer Thermal Processing
- Testing & Characterization
- Etching, Machining, & Bonding
- Packaging
- Electron Microscopy & Imaging
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- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
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- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
User InformationUser Information Dropdown Toggle
- How to Become a User
- FOM- Facility Online Manager
- Standard Operating Procedures (SOP's)
- Characterization Data
- Dicing Request
- Photomask Request
- Cleanroom Safety Guidelines
- SDS Database
- L-Edit design
- Photoresist Profiles for DRIE S1827 and AZ4620
- PEALD and ALD SOP
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- MNTC Rates Effective 6-1-2023
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ECE 544 Microfabrication/MEMS Laboratory
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PDF document icon az4620photoresist.pdf — PDF document, 9 KB (9442 bytes)

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