Electron Microscope Core Equipment

AVAILABLE EQUIPMENT

Hitachi HT7700 Located at the University of Louisville

- Located at the University of Louisville MDR Building, Room 526
- Dual-Mode objective lens

Imaging

  • 120 kV compact-digital Biological transmission electron microscope.
  • User-friendly electron microscope that can be used in a lighted room.
  • Fully digital, so samples can be scanned simply be viewing a computer screen. This is particularly important for viewing low contrast samples, and is convenient for training students.
  • Associated software allows user to track the regions of tissue that have been viewed
  • Includes an automated multi-frame function, which facilitates efficient and precise data collection.

Leica UC7 Ultramicrotome Located at the University of Louisville

- Located at the University of Louisville MDR Building
- Ultramicrotome for ultrathin sectioning of samples for EM.

Leica Ultramicrotome Features

  • Adjustable cutting window (0.3-15mm) and cutting speed (0.2-90mm/s wheel controlled)
  • 360° rotatable knife block
  • Knife holder for 6-12mm knives
  • Top/back light LED Illumination
  • Magnification: S4E: 10X-48X

Cutting Transmission: vibration decoupled gravity stroke

Coarse knife-movements: N-S: 10mm stepping motor
E-W: 25mm manual drive

Zeiss Supra 35VP Located at the University of Louisville

- Located at the University of Louisville Huson Imaging and Characterization Laboratory
- Scanning electron microscope (SEM)

Imaging

  • 5 nm resolution imaging
  • STEM detector
  • Backscatter detector
  • Energy Dispersive X-Ray Spectroscopy (Bruker
Located at the University of Louisville

Zeiss EVO-40 Located at the University of Louisville

- Located at the University of Louisville Huson Imaging and Characterization Laboratory
- Extreme Variable Pressure (3000 Pa) scanning electron microscope

Accessories:

  • Backscatter detector
  • VPSE detector
  • Peltier stage - 25°C to 50°C (Deben)
  • Humidity Control Option

Gold/ Gold-Palladium Sputter Coater with Thickness monitor Located at the University of Louisville

- Located at the University of Louisville Huson Imaging and Characterization Laboratory
- Scanning electron microscope (SEM)

Located at the University of Louisville

Asylum MFP-3D-Original AFM Located at the University of Louisville

- Located at the University of Louisville Huson Imaging and Characterization Laboratory
- Scanning electron microscope (SEM)

Asylum MFP-3D-BIO Located at the University of Louisville

- Located at the University of Louisville Huson Imaging and Characterization Laboratory
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  • Conductive AFM probe holder and I-V measurement capabilities

JEOL 2010F Located at the University of Kentucky

- Located at the University of Kentucky
- Dual-Mode objective lens

JEOL 2010F Features

Field Emission Gun operating at 200 keV
Resolution: 0.19 nm point-to-point imaging
Specimen Stage: +- 12 degree tilt
JEOL single, double low background, and GATAN cryo double tilt holders available
Fischione HAADF detector for Z-contrast STEM
Oxford INCA EDX detector
EmiSpec EsVision
GATAN GIF 2000 EELS spectrometer

Ideal for:  EDS for elemental profiling and mapping, EELS for light element analysis and mapping, SAD for crystal phase structural analysis, high-angle annular dark field (HAADF) STEM for Z-contrast; useful for composite and catalyst research

FEI Helios Nanolab 660Located at the University of Kentucky

- Located at the University of Kentucky
- Dual-Mode objective lens

Imaging

Field Emission Gun (Schottky emitter), with UC technology (monochromator)
Sub-nanometer resolution from 500 V to 30 kV

Beam deceleration capabilities (stage bias)
Specimen Stage: x, y 150 mm; z 10mm all piezo driven; tilt -10 to +60°

Six electron detectors for optimal imaging

Focused Ion Beam (FIB)

Gallium LMIS (Liquid Metal Ion Source) for precision milling, cross-sectioning, TEM sample preparation

Gas Injection System (GIS) for metal and insulator deposition

Slice milling and imaging steps automated for 3D SEM reconstruction

Characterization

Oxford EDX detector for elemental analysis
Oxford EBSD detector for crystal orientation analysis

3D EDX and EBSD capabilties

Ideal for: Ultra high resolution imaging, in-situ cross-sectioning and TEM sample preparation, automated surface pattern generation (milling or deposition), 3D SEM, EDS and EBSD reconstruction

Hitachi S-4300 Located at the University of Kentucky

- Located at the University of Kentucky
- Dual-Mode objective lens
- analytical capabilities for biological and materials science.

Hitachi S-4300 Features

Filament Type: Cold-cathode field emission

Detectors: SE/BSE/EBSD

Image Resolution: Secondary Electron = 1.5 nm

Specimen Stage: Motion range = 50 x 100 mm

Tilt angle = – 5° to + 60 °

Rotation = 360° (continuous)

Max Specimen Size: 19×102 mm (height x dia)

Oxford HKL Electron Backscatter Diffraction (EBSD) system for crystal texture analysis and orientation image

Ideal for: high resolution imaging, crystal orientation, Z-contrast imaging

FEI Quanta 250 Features Located at the University of Kentucky

- Located at the University of Kentucky
- Dual-Mode objective lens
- analytical capabilities for biological and materials science.

FEI Quanta 250 Features

Filament Type: field emission

Detectors: SE/BSE/EDX/STEM/E-SEM

Image Resolution: Secondary Electron = 1.0 nm

Specimen Stage: X-Y 50 mm

Tilt angle = – 15° to + 75 °

Rotation = 360° (continuous)

Max Specimen Size: 19×102 mm (height x dia)

Low vacuum capability for environmental SEM

Peltier cooling stage for low temperatures work / heating stage up to 800°C

Solution injection needle

 

 

Ideal for: high resolution imaging, EDX, biological samples, temperature variation

Zeiss EVO MA 10 Located at the University of Kentucky

- Located at the University of Kentucky
- Dual-Mode objective lens

Zeiss EVO MA 10 Features

Filament Type: Tungsten

Detectors: SE/VPSE (environmental)/BSE/EDX

Image Resolution: Secondary Electron = 1.9 nm

Specimen Stage: 5-axis motorized stage          80 x 100 x 35mm (translation XYZ)

Tilt angle = – 10 ° to + 90 °

Rotation = 360 ° (continuous)

Specimen Size: 100 mm x 200 mm (Height x Diameter), max weight 500g

 

Ideal for: elemental analysis and mapping, biological samples, large samples, fracture analysis, Z-contrast imaging

Sample preparation at the University of Kentucky

The EMC provides access to many sample preparation equipment, from precision saw to ion polishing. Here is a list of the equipment:

  • Buehler Isomet: low speed precision saw
  • Buehler Ecomet 3: mechanical polishing
  • Allied High Tech Multiprep: mechanical automated polishing and thinning for advanced sample preparation
  • Buehler Vibromet 2: vibration polishing for final preparation of EBSD samples
  • Buehler Minimet 1000: precision mechanical polishing/grinding of small specimens
  • Gatan Ultrasonic Disc Cutter (Model 601): disk cutting for TEM sample preparation
  • Gatan Dimpler/Grinder (Model 656): grinding/dimpling of TEM samples

JEOL 1400Plus TEM Located at western Kentucky University

- Located at Western Kentucky University Ogden College Electron Microscopy Center
The facility is designed to handle groups of 10-15 students for demonstrations at each microscope, or sample preparation, including ultramicrotome use.

  • Equipped with IXRF-EDS detectors for elemental analysis
  • View samples either as analog images on a phosphor screen or contrast-enhanced digital images using an AMT CCD camera
  • Images can be captured either on film (ultimately scanned to 1.3 Gpixels) or on computer (8 Mpixels)

JEOL 5410LV SEM Located at western Kentucky University

- Located at Western Kentucky University Ogden College Electron Microscopy Center
- Dual-Mode objective lens
The facility is designed to handle groups of 10-15 students for demonstrations at each microscope, or sample preparation, including ultramicrotome use.

  • Equipped with IXRF-EDS detectors for elemental analysis
  • Useful for imaging surface structures
  • Can also be used for imaging three-dimensional structures embedded in plastic either by viewing serial sections mounted on a conductive substrate or by imaging the sample at the surface of the block face after each cut

LOCATION OF EQUIPMENT: