ChE 594 Special Topics: Chemical Vapor Deposition
1998‑2000 Catalog Data: ChE 594 Special Topics in Chemical Engineering. Credits 3.
Prerequisites by Topic:
Undergraduate or Graduate Thermodynamics
Undergraduate Reactor Design
Undergraduate or Graduate Transport Phenomena
Undergraduate Course on Materials Science
Textbooks: No prescribed textbook. Class notes chapters from several books and handouts.
Course Objectives: Following this course students will:
Understand the concepts involved in the deposition of thin and thick films using various Chemical Vapor Deposition (CVD) methods.
Apply chemical kinetics (gas phase, gas-solid and plasma), thermodynamics and transport concepts to understand and design the chemical vapor deposition process.
Understand the nucleation and growth aspects of the vapor grown films, thin and thick film science.
Topics Covered:
Overall review of various CVD Systems and vacuum environments
Thermodynamic principles involved with gas phase and gas-solid systems in CVD reactors
Chemical kinetics of gas phase and gas-solid reactions
Chemistry of plasma systems
Transport considerations in CVD reactors
Thin and thick films science
Stresses in Films
Single crystal surfaces and epitaxy
Nucleation, Growth & Morphology
Texturing of polycrystalline films
Role of defects during growth and on the film properties
Laboratory assignments using CHEMKIN III & SAMPR programs (Licensed from Reaction Design, Inc. & NASA)
Equilibrium analysis of gas phase reactions and gas-solid reactions
Sensitivity and steady state analysis
Modeling of plasma gas phase chemistry
Written term paper in a proposal format
Class Schedule: Two lecture sessions per week, each of 75 minutes duration.
Contribution of course to meeting the professional component:
Fifth year and graduate elective course
Applications of chemical kinetics & transport processes to vapor phase materials synthesis
Focus on practical applications of CVD reactors, processes, electronic & amorphous materials