Microtechnology Fabrication

Micro/Nanotechnology Center

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  • MEMS fabrication by photolithographic processing.
  • Deep etching, back-to-front side aligned patterns.
  • Glass-silicon wafer bonding.
  • Photo-mask using a submicron resolution Heidelberg Instruments laser pattern generator.


Huson Nanotechnology Core Facility

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    The Huson Nanotechnology Core facility (HNCF) houses a complete suite of Scanning Electron Microscopes and Atomic Force Microscopes for both imaging and creating novel nano-scale structures. The Facility (1200 sq. ft.) contains extensive nano- imaging, manipulation and probing equipment, together with specialized nanofabrication equipment. Many of these instruments in the facility are the first of their kind in Kentucky, and a few instruments are the first of their kind in the United States (Asylum Haptic AFM, Obducat Nanoimprinter).

  • Zeiss Supra 35, Zeiss EVO Extreme Variable Pressure (3000 Pa)
  • Zeiss 1430 scanning electron microscope with Nabity lithography package
  • Capabilities for handling biological samples